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An epigenome‐wide DNA methylation study of workers with an occupational exposure to lead

机译:具有职业暴露铅的工人的外延一致性DNA甲基化研究

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Abstract Using the Illumina Infinium Methylation EPIC BeadChip (850?K), we report genome‐wide differences in DNA methylation between occupational workers with high blood Pb levels (BLL) and low BLL. We observed 356 significant CpG sites. In particular, GSTM1 methylation was negatively associated with high BLL. Gene ontology and KEGG pathway enrichment analysis were performed to determine the complex biological systems of Pb exposure. Enriched gene sets were involved in the oxidation‐reduction process, glutathione derivative biosynthetic process and nervous system development. To our knowledge, this is the first study to employ an 850?K array to examine whether workers with occupational exposure to high levels of Pb can have an epigenetic effect on the DNA methylation pattern.
机译:摘要使用Illumina Infinium ePic Beadchip(850?K),我们在高血PB水平(BL1)和低BL1中报告职业工人之间的DNA甲基化的基因组差异。 我们观察了356个重要的CPG网站。 特别地,GSTM1甲基化与高BL1负相关。 进行基因本体和Kegg途径富集分析,以确定Pb暴露的复杂生物学系统。 富集的基因集参与氧化还原过程,谷胱甘肽衍生物生物合成过程和神经系统发育。 为我们的知识,这是第一次使用850?K阵列的研究,以检查具有职业暴露于高水平Pb的工人是否可以对DNA甲基化模式具有表观遗传效应。

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