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Investigation of HEMT and MESFET with Notch in Side of Drain

机译:排水侧面缺口腹部和MESFET的研究

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In this study, we investigate the requirement of high electron mobility field-effect transistors with hetero-structure and evaluate its performance at the high-frequency circuits. Needs, benefits and so computing the transistor are fully described. High electron mobility transistors are divided into three groups: pHEMT, mHEMT and induced HEMT. Quantum mechanism of electron in the channel and potential wells provides the most traits for high frequency transistors. Through drift-diffusion simulation shows that gate with small notch in side of the drain, can improve drain current and cutoff frequency. This indicates that without changing the gate length, capacitor of gate-source can be reduced.
机译:在这项研究中,我们研究了具有异质结构的高电子移动场效应晶体管的要求,并评估其在高频电路的性能。 完全描述了计算晶体管的需求,益处等。 高电子迁移率晶体管分为三组:PHEMT,MHEMT和诱导的HEMT。 通道和潜在孔中电子的量子机制为高频晶体管提供了最多的性状。 通过漂移扩散仿真显示,漏极侧的小凹口的闸门可以提高漏极电流和截止频率。 这表明可以在不改变栅极长度的情况下,可以减小门源的电容器。

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