Maskless lithography of CMOS-compatible materials for hybrid plasmonic nanophotonics: aluminum nitride/aluminum oxide/aluminum waveguides

Roberts M. Joseph; Moran Mark; Johnson Linda F.; Freeman Will

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Maskless lithography of CMOS-compatible materials for hybrid plasmonic nanophotonics: aluminum nitride/aluminum oxide/aluminum waveguides

机译：用于混合等渗型混合型纳米酚源性的CMOS - 兼容材料的无掩模光刻：氮化铝/氧化铝/铝波导

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We demonstrate maskless lithography fabrication of nanolayered heterostructured hybrid plasmonic waveguides. This includes the measured optical properties of pulsed magnetron sputtered 15 nm films of aluminum oxide and aluminum nitride. Hybrid plasmonic waveguides, where the modes highest intensity is largely confined to the thin aluminum oxide layer, were constructed by maskless lithography using an aperture-type near-field scanning optical microscope. (C) 2018 Society of Photo-Optical Instrumentation Engineers (SPIE)

机译：我们展示了无掩模型异质结构杂交等离子体波导的无掩模光刻制造。这包括脉冲磁控溅射15nm氧化铝铝膜的测量光学性质和氮化铝。混合等离子体波导，其中模式最高强度主要被限制在薄氧化铝层上，通过使用孔型近场扫描光学显微镜通过掩模光刻构成。（c）2018年光学仪表工程师协会（SPIE）

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《Journal of Nanophotonics》 |2018年第2期|共14页
作者
Roberts M. Joseph; Moran Mark; Johnson Linda F.; Freeman Will;
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作者单位

US Navy Air Warfare Ctr Weapons Div Chem Branch Res Directorate China Lake CA 93555 USA;

US Navy Air Warfare Ctr Weapons Div Chem Branch Res Directorate China Lake CA 93555 USA;

US Navy Air Warfare Ctr Weapons Div Chem Branch Res Directorate China Lake CA 93555 USA;

US Navy Air Warfare Ctr Phys Div China Lake CA 93555 USA;

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正文语种 eng
中图分类计量学;
关键词
optical materials; maskless lithography; hybrid plasmonic modes; waveguides;

机译：光学材料;无掩模光刻;混合等离子体模式;波导;

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1. Maskless lithography of CMOS-compatible materials for hybrid plasmonic nanophotonics: aluminum nitride/aluminum oxide/aluminum waveguides [J] . Roberts M. Joseph, Moran Mark, Johnson Linda F., Journal of Nanophotonics . 2018,第2期

机译：用于混合等渗型混合型纳米酚源性的CMOS - 兼容材料的无掩模光刻：氮化铝/氧化铝/铝波导
2. Thermal oxidation properties of titanium nitride and titanium-aluminum nitride materials — A perspective for high temperature air-stable solar selective absorber applications [J] . Y. Yin, L. Hang, S. Zhang, Thin Solid Films . 2007,第5期

机译：氮化钛和氮化钛铝材料的热氧化性能-高温空气稳定的太阳能选择性吸收器应用的前景
3. Extreme tunability in aluminum doped Zinc Oxide plasmonic materials for near-infrared applications [J] . A. K. Pradhan, R. M. Mundle, Kevin Santiago, Scientific reports. . 2014,第1期

机译：铝掺杂氧化锌等离激元材料在近红外应用中的极端可调性
4. INTEGRATION OF SILICON AND DIAMOND, ALUMINUM NITRIDE OR ALUMINUM OXIDE FOR ELECTRONIC MATERIALS [C] . Symposium on III-V and IV-IV materials and processing challenges for highly integrated microelectronics and optoelectronics . 1999

机译：用于电子材料的硅和金刚石，氮化铝或氧化铝的整合
5. High Quality Aluminum Doped Zinc Oxide Plasmonic and Hyperbolic Metamaterials via Atomic Layer Deposition [D] . Riley, Conor T. 2016

机译：高品质铝掺杂氧化锌等级和双曲面通过原子层沉积
6. Extreme tunability in aluminum doped Zinc Oxide plasmonic materials for near-infrared applications [O] . A. K. Pradhan, R. M. Mundle, Kevin Santiago, -1

机译：铝掺杂的氧化锌等离子材料在近红外应用中具有极高的可调谐性
7. Extreme tunability in aluminum doped Zinc Oxide plasmonic materials for near-infrared applications [O] . A. K. Pradhan, R. M. Mundle, Kevin Santiago, 2014

机译：铝掺杂氧化锌等近红外应用的极端可调性
8. Aluminum Oxides as Imaging Materials for 193-nm Excimer Laser Lithography. [R] . Pang, S., Kunz, R. R., Rothschild, M., 1989

机译：氧化铝作为193纳米准分子激光光刻的成像材料。

Maskless lithography of CMOS-compatible materials for hybrid plasmonic nanophotonics: aluminum nitride/aluminum oxide/aluminum waveguides

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