• 主题
高级搜索  >
历史搜索 清空历史
首页> 外文期刊>Journal of Materials Engineering and Performance >Influence of Microstructure, Composition and Morphology on Tribological Performance of WTiN Coatings Obtained by DC Magnetron Sputtering at Various Working Pressures
【24h】

Influence of Microstructure, Composition and Morphology on Tribological Performance of WTiN Coatings Obtained by DC Magnetron Sputtering at Various Working Pressures

机译：微观结构，组成和形态对DC磁控溅射在各种工作压力下获得的WTIN涂层的摩擦学性能影响

获取原文
获取原文并翻译 | 示例
           
页面导航
  • 摘要
  • 著录项
  • 相似文献
  • 相关主题

摘要

In this work, WTiN thin films were produced on silicon substrates using the DC magnetron sputtering technique varying the working pressure and keeping the power constant at 90 W and conducting the process at room temperature. The structure and morphology of the coatings were analyzed using the x-ray diffraction technique, which allowed the identification of a rock salt type FCC structure, with a relatively low micro-strain, and a grain size in the order of nm exhibiting a nanostructure formation. Elemental composition and the binding energies of samples were obtained using x-ray photoelectron spectroscopy and showed W-Ti-N chemical bonds and hence the formation of the ternary nitride. Moreover, a great influence of the pressure on the stoichiometry was identified, as a result of the differences in the deceleration and diffusion behavior of W and Ti atoms. The surface grain size and roughness (on average approximately 34 and 8.7 nm, respectively) of the coatings were determined using atomic force microscopy. Changes in the morphology can be attributed to re-sputtering and the adatoms mobility processes, as a part of the growth mechanism. Finally, for determining the tribological behavior, scratch and pin on disk tests were conducted. According to the results, the roughness and the pressure had a great influence on the coefficient of friction and the wear rate; however, the working pressure had no significant influence on the adherence of the films.
机译：在这项工作中，使用改变工作压力的DC磁控溅射技术在硅基板上制造WTIN薄膜，并将功率恒定保持在90W并在室温下进行处理。使用X射线衍射技术分析涂层的结构和形态，其允许岩盐型FCC结构鉴定，具有相对低的微菌株，并且谷粒尺寸为纳米结构形成纳米结构。使用X射线光电子能谱获得元素组成和样品的结合能量，并显示W-Ti-N化学键，因此形成三元氮化物。此外，由于W和Ti原子的减速度和扩散行为的差异，鉴定了对化学计量的压力对化学计量的影响很大。使用原子力显微镜测定涂层的表面粒度和粗糙度（平均约34和8.7nm）。形态的变化可以归因于重新溅射和迁移率工艺，作为生长机制的一部分。最后，为了确定摩擦学行为，进行磁盘测试的划痕和销。根据结果​​，粗糙度和压力对摩擦系数和磨损率有很大影响;然而，工作压力对薄膜的粘附没有显着影响。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱：kefu@zhangqiaokeyan.com

京公网安备：11010802029741号 ICP备案号：京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有

  • 客服微信

  • 服务号