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Diffusion Bonding of TiAl to Ti6Al4V Using Nanolayers

机译:使用纳米组的TiAl到Ti6Al4V的扩散键合

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Microstructural characterization of TiAl to Ti6Al4V dissimilar diffusion bonds assisted by reactive Ni/Al nanolayers was performed in this study. The nanolayers (alternated Al and Ni) were deposited onto the base material surfaces. Diffusion bonding was performed at 700 and 800?°C under pressures from 5 to 40?MPa and dwell times between 60 and 180?min. Microstructural characterization was performed using high-resolution transmission and scanning electron microscopies. The observations revealed that dissimilar TiAl to Ti6Al4V joints assisted by Ni/Al reactive nanolayers can be obtained successfully at 800?°C during 60?min using a pressure of 20?MPa. The bond interface is thin (less than 10?μm) and is mainly composed of NiAl grains. Thin layers of Al-Ni-Ti intermetallic compounds were formed adjacent to the base materials.
机译:本研究进行了反应性Ni / Al纳米组辅助辅助Ti6Al4V异种扩散键的微观结构表征。 纳米组(交替的Al和Ni)沉积在基材表面上。 在5至40℃的压力下在700和800℃下进行扩散键合,在60至180℃之间的压力和停留时间。 使用高分辨率传输和扫描电子显微镜进行微观结构表征。 观察结果表明,使用Ni / Al反应性纳米组辅助的Ti6Al4V接头可以在60℃下在60℃下使用20≤MPa的压力成功地在800Ω℃下成功获得。 粘合界面薄(小于10?μm),主要由Nial谷物组成。 薄层Al-Ni-Ti金属间化合物与基材相邻形成。

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