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首页> 外文期刊>ACS applied materials & interfaces >Direct Coating Adherent Diamond Films on Fe-Based Alloy Substrate: The Roles of Al, Cr in Enhancing Interfacial Adhesion and Promoting Diamond Growth
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Direct Coating Adherent Diamond Films on Fe-Based Alloy Substrate: The Roles of Al, Cr in Enhancing Interfacial Adhesion and Promoting Diamond Growth

机译：在铁基合金基底上直接涂覆附着金刚石薄膜：Al，Cr在增强界面附着力和促进金刚石生长中的作用

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摘要

Direct CVD deposition of dense, continuous, and adherent diamond films on conventional Fe-based alloys has long been considered impossible. The current study demonstrates that such a deposition can be realized on Al, Cr-modified Fe-based alloy substrate (FeAl or FeCrAl). To clarify the fundamental mechanism of Al, Cr in promoting diamond growth and enhancing interfacial adhesion, fine structure and chemical analysis around the diamond film—substrate interface have been comprehensively characterized by transmission electron microscopy. An intermediate graphite layer forms on those Al-free substrates such as pure Fe and FeCr, which significantly deteriorates the interfacial adhesion of diamond. In contrast, such a graphite layer is absent on the FeAl and FeCrAl substrates, whereas a very thin Al-rich amorphous oxide sublayer is always identified between the diamond film and substrate interface. These comparative results indicate that the Al-rich interfacial oxide layer acts as an effective barrier to prevent the formation of graphite phase and consequently enhance diamond growth and adhesion. The adhesion of diamond film formed on FeCrAl is especially superior to that formed on FeAl substrate. This can be further attributed to a synergetic effect including the reduced fraction of Al and the decreased substrate thermal-expansion coefficient on FeCrAl in comparison with FeAl, and a mechanical interlocking effect due to the formation of interfacial chromium carbides. Accordingly, a mechanism model is proposed to account for the different interfacial adhesion of diamond grown on the various Fe-based substrates.
机译：长期以来，人们一直认为不可能在传统的铁基合金上直接进行CVD沉积致密，连续和附着的金刚石膜。当前的研究表明，可以在Al，Cr改性的Fe基合金基底（FeAl或FeCrAl）上实现这种沉积。为了阐明Al，Cr促进金刚石生长和增强界面附着力的基本机理，已通过透射电子显微镜全面表征了金刚石膜-基底界面周围的精细结构和化学分析。在那些无铝的基材（例如纯Fe和FeCr）上形成中间石墨层，这会严重破坏金刚石的界面粘合力。相反，在FeAl和FeCrAl基底上不存在这种石墨层，而在金刚石膜和基底界面之间总是发现非常薄的富含Al的非晶氧化物子层。这些比较结果表明，富铝界面氧化物层可作为有效的阻挡层，防止石墨相的形成，从而增强金刚石的生长和附着力。在FeCrAl上形成的金刚石膜的附着力尤其优于在FeAl基底上形成的金刚石膜。这可以进一步归因于协同效应，包括与FeAl相比，Al的含量降低，FeCrAl的基底热膨胀系数降低，以及由于形成界面碳化铬而产生的机械互锁效应。因此，提出了一种机理模型来解释在各种基于铁的基底上生长的金刚石的不同界面粘附性。

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