机译:表面化学反应氢化化学气相沉积石墨烯的官能化
Department of Low Dimensional Systems J. Heyrovsky Institute of Physical Chemistry Academy of Sciences of the Czech Republic v.v.i. Dolejskova 2155/3 18223 Prague 8 (Czech Republic);
Department of Low Dimensional Systems J. Heyrovsky Institute of Physical Chemistry Academy of Sciences of the Czech Republic v.v.i. Dolejskova 2155/3 18223 Prague 8 (Czech Republic);
Department of Low Dimensional Systems J. Heyrovsky Institute of Physical Chemistry Academy of Sciences of the Czech Republic v.v.i. Dolejskova 2155/3 18223 Prague 8 (Czech Republic);
functionalization; graphene; hydrogenation; Raman spectroscopy; surface chemistry;
机译:表面化学反应氢化化学气相沉积石墨烯的官能化
机译:化学功能化化学气相沉积生长石墨烯的机械应变
机译:通过等离子体增强化学气相沉积的多相结构氢化非晶硅氮化膜薄膜
机译:化学气相沉积(CVD)在铜上生长的六角形石墨烯岛的摩擦行为
机译:化学气相沉积利用石墨烯的悬浮谐振器纳米机电研究
机译:通过化学气相沉积法在石墨烯上生长的量子霍尔电阻标准碳化硅
机译:封面图片:表面化学反应(Chem.EUR。J. 17/2017)氢化化学气相沉积石墨烯的氢化化学气相沉积石墨烯的功能化
机译:化学气相沉积法制备石墨烯中单个晶粒和晶界的控制与表征。