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首页> 外文期刊>ACS applied materials & interfaces >Growth of Large-Scale, Large-Size, Few-Layered alpha-MoO3 on SiO2 and Its Photoresponse Mechanism
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Growth of Large-Scale, Large-Size, Few-Layered alpha-MoO3 on SiO2 and Its Photoresponse Mechanism

机译：大型大尺寸，少数少数层次的SiO2的生长及其光响应机制

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摘要

Layered alpha-MoO3 is a multifunctional material that has significant application in optoelectronic devices. In this study, we show the growth of large-scale, large-size, few-layered (FL) alpha-MoO3 nanosheet directly on technical substrates (SiO2 and Si) by physical vapor deposition. We suggest that the growth is self-limiting in the [010] direction because of the re evaporation and high diffusion capacity of MoOx species at high temperature. As-prepared FL a-MoO3 is nonconductive and shows poor response to photoillumination with wavelength of 405 and 630 nm. Its work function is strongly altered by the substrate. Improvement of conductivity and photoresponse is observed after the FL device is annealed in vacuum. Line defects along the [001], [100], and [101] directions belonging to the generation of O-s and O-a vacancy states appear, and the interfacial effect is suppressed. Scanning near-field optical microscope shows that the defects are absorption sites. Kelvin probe force microscope reveals decrease of apparent work function under illumination, which confirms that electrons are excited from defects states. Our findings show that intense studies on defect engineering are required to push forward the application of two-dimensional metal oxides.
机译：分层的alpha-moo3是一种多功能材料，可在光电器件中具有显着应用。在这项研究中，通过物理气相沉积，我们将大规模，大尺寸，少数少数（FL）α-Moo3纳米电池（SiO2和Si）的生长展示。我们建议在高温下的MOOX物种的蒸发和高扩散能力，增长在方向上自动限制。如制备的FL A-MOO3是非导电的并且表示对波长为405和630nm的光滤射的响应差。其工作功能受到基板的强烈改变。在真空中退火之后，观察到导电性和光响应的改善。出现沿着[001]，[100]和[101]的线缺陷，属于O-S和O-A空位状态，抑制了界面效应。扫描近场光学显微镜表明缺陷是吸收位点。 Kelvin探针力显微镜显露在照明下表现出明显的工作功能降低，这证实了电子从缺陷状态激发。我们的研究结果表明，需要对缺陷工程进行强烈研究，以推进二维金属氧化物的应用。

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  • 作者

    Wang Yu; Du Xiang; Wang Diming; Su Mingze; Wan Xi; Meng Hui; Xie Weiguang; Xu Jianbin; Liu Pengyi;

  • 作者单位

    Jinan Univ Dept Phys Guangzhou Key Lab Vacuum Coating Technol &

    New En Siyuan Lab Guangzhou 510632 Guangdong Peoples R China;

    Jinan Univ Dept Phys Guangzhou Key Lab Vacuum Coating Technol &

    New En Siyuan Lab Guangzhou 510632 Guangdong Peoples R China;

    Jinan Univ Dept Phys Guangzhou Key Lab Vacuum Coating Technol &

    New En Siyuan Lab Guangzhou 510632 Guangdong Peoples R China;

    Jinan Univ Dept Phys Guangzhou Key Lab Vacuum Coating Technol &

    New En Siyuan Lab Guangzhou 510632 Guangdong Peoples R China;

    Chinese Univ Hong Kong Dept Elect Engn &

    Mat Sci Hong Kong Hong Kong Peoples R China;

    Jinan Univ Dept Phys Guangzhou Key Lab Vacuum Coating Technol &

    New En Siyuan Lab Guangzhou 510632 Guangdong Peoples R China;

    Jinan Univ Dept Phys Guangdong Prov Key Lab Opt Fiber Sensing &

    Commun Guangzhou 510632 Guangdong Peoples R China;

    Chinese Univ Hong Kong Dept Elect Engn &

    Mat Sci Hong Kong Hong Kong Peoples R China;

    Jinan Univ Dept Phys Guangzhou Key Lab Vacuum Coating Technol &

    New En Siyuan Lab Guangzhou 510632 Guangdong Peoples R China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 化学工业;
  • 关键词

    MoO3; two-dimensional materials; physical vapor deposition; surface defects; photoresponse;

    机译：moo3;二维材料;物理气相沉积;表面缺陷;光响应;

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