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首页> 外文期刊>Journal of Applied Polymer Science >Vapor deposition polymerization of synthetic rubber thin film in a plasma enhanced chemical vapor deposition reactor
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Vapor deposition polymerization of synthetic rubber thin film in a plasma enhanced chemical vapor deposition reactor

机译：血浆增强化学气相沉积反应器中合成橡胶薄膜的气相沉积聚合

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摘要

Rubber is one of the most commonly used industrial materials worldwide. However, there is a gap in the literature on the production of rubber thin films in nanoscale. When the rubber thin films are produced in nanoscale, they can be used in high-tech applications where bulk rubbers have never been used before. This study is one of the first investigations to focus on the vapor-based production of the polyisoprene (PI), which is an important member of the synthetic rubber class. For this purpose, a single-step, rapid and environmentally friendly method based on plasma enhanced chemical vapor deposition (PECVD) was employed to produce PI thin films using 2-methyl-1,3-butadiene (isoprene). The high-vapor pressure of isoprene makes it a promising monomer for the production of chemical vapor deposition polymers. The effect of plasma processing parameters on the PI deposition rate was investigated. The deposition rate of PI thin film as high as 40 nm/min was achieved and the contact angle of PI coated bamboo surface was found to be 146.8 degrees. The mechanical durability and laundering tests of PI thin films were performed. Based on this study results, PI thin films produced by PECVD can be used in a number of potential applications.
机译：橡胶是世界上最常用的工业材料之一。然而，在纳米尺度上制备橡胶薄膜的文献中还存在空白。当橡胶薄膜以纳米级生产时，它们可以用于以前从未使用过大块橡胶的高科技应用。这项研究是第一批以蒸汽为基础生产聚异戊二烯（PI）的研究之一，PI是合成橡胶类的重要成员。为此，采用了一种基于等离子体增强化学气相沉积（PECVD）的单步、快速和环境友好的方法，以2-甲基-1,3-丁二烯（异戊二烯）为原料制备PI薄膜。异戊二烯的高蒸气压使其成为化学气相沉积聚合物生产中很有前途的单体。研究了等离子体工艺参数对PI沉积速率的影响。PI薄膜的沉积速率高达40nm/min，涂层竹材表面的接触角为146.8度。对PI薄膜进行了机械耐久性和耐洗涤性试验。基于这一研究结果，PECVD制备的PI薄膜可用于许多潜在的应用。

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