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首页> 外文期刊>ACS combinatorial science >Simultaneous Measurements of Photoabsorption and Photoelectrochemical Performance for Thickness Optimization of a Semiconductor Photoelectrode
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Simultaneous Measurements of Photoabsorption and Photoelectrochemical Performance for Thickness Optimization of a Semiconductor Photoelectrode

机译:用于厚度优化的光吸收和光电化学性能的同时测量半导体光电极的厚度优化

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摘要

We established a system for simultaneous measurements of photoelectrochemical (PEC) reaction and photoabsorption in a semiconductor photoelectrode. This system uses a photoacoustic technique and photoelectrodes with a film-thickness gradient that was prepared by electrophoretic deposition of tungsten(VI) oxide particles while pulling up a substrate. The system enabled high-throughput determination of optimum film thickness, and the results showed that irradiation direction has a significant influence on PEC performance for a photoelectrode with a thick film. Furthermore, the mechanism of enhancement of PEC performance by postnecking treatment was discussed.
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