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Study Results for Intensity of Sputtering of Thin Carbon Films by Uranium Fission Fragments

机译:铀裂化碎片对薄碳膜溅射强度的研究结果

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摘要

The paper presents the results of investigating sputtering by uranium fission fragments of thin carbon films produced by a method of thermal vacuum deposition. In accordance with the investigations carried out, the intensity of sputtering of carbon films does not exceed similar to 50 atoms per fission fragment, which indicates the possibility of their use as protective coatings for uranium layers.
机译:本文介绍了用热真空沉积法制备的碳薄膜中铀裂变碎片溅射的研究结果。根据所进行的调查,碳膜的溅射强度不超过类似于每个裂变碎片50个原子,这表明它们有可能用作铀层的保护涂层。

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