Effect of varying N_2 pressure on DC arc plasma properties and microstructure of TiAlN coatings

B Syed; T-W Hsu; A B B Chaar; P Polcik; S Kolozsvari; G H?kansson; J Rosen; L J S Johnson; I Zhirkov; J M Andersson; M J J?esaar; M Odén

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Effect of varying N_2 pressure on DC arc plasma properties and microstructure of TiAlN coatings

机译：不同N_2压力对TiAln涂层直流电弧菌性能和微观结构的影响

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Detailed knowledge of correlations between direct current (DC) cathodic arc deposition process parameters, plasma properties, and the microstructure of deposited coatings are essential for a comprehensive understanding of the DC cathodic arc deposition process. In this study we have probed the plasma, generated by DC arc on a Ti-50 at.% Al cathode in a N_2 ambience, at the growth front of the TiAlN coating. Several consequences of an increasing N_2 pressure are observed, including a decreased electron temperature, an increased electron density, and a loss of energetic ions. As a result, the preferred growth texture switches from 220 to 111. It is also observed that neutrals in the plasma can significantly contribute to the growth of TiAlN coatings.

机译：详细了解直流（DC）阴极弧沉积工艺参数、等离子体特性和沉积涂层微观结构之间的相关性对于全面了解直流阴极弧沉积工艺至关重要。在这项研究中，我们探测了在Ti-50 at.%上由直流电弧产生的等离子体TiAlN涂层生长前沿的N_2气氛中的铝阴极。观察到N_2压力增加的几个后果，包括电子温度降低、电子密度增加和高能离子损失。因此，首选生长纹理从220切换到111。还观察到等离子体中的中性粒子对TiAlN涂层的生长有显著的贡献。

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来源
《Plasma Sources Science & Technology》 |2020年第9期|共10页
作者
B Syed; T-W Hsu; A B B Chaar; P Polcik; S Kolozsvari; G H?kansson; J Rosen; L J S Johnson; I Zhirkov; J M Andersson; M J J?esaar; M Odén;
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作者单位

Nanostructured Materials Department of Physics Chemistry and Biology Link?ping University SE-581 83 Link?ping Sweden;

Nanostructured Materials Department of Physics Chemistry and Biology Link?ping University SE-581 83 Link?ping Sweden;

Nanostructured Materials Department of Physics Chemistry and Biology Link?ping University SE-581 83 Link?ping Sweden;

PLANSEE Composite Materials GmbH Lechbruck am See DE-86983 Germany;

PLANSEE Composite Materials GmbH Lechbruck am See DE-86983 Germany;

Ionbond Sweden AB Box 1161 Link?ping SE-58111 Sweden;

Thin Films Physics Department of Physics Chemistry and Biology Link?ping University SE-581 83 Link?ping Sweden;

Nanostructured Materials Department of Physics Chemistry and Biology Link?ping University SE-581 83 Link?ping Sweden;

Thin Films Physics Department of Physics Chemistry and Biology Link?ping University SE-581 83 Link?ping Sweden;

Seco Tools AB SE-737 82 Fagersta Sweden;

Nanostructured Materials Department of Physics Chemistry and Biology Link?ping University SE-581 83 Link?ping Sweden;

Nanostructured Materials Department of Physics Chemistry and Biology Link?ping University SE-581 83 Link?ping Sweden;

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原文格式 PDF
正文语种 eng
中图分类等离子体物理学;
关键词
arc plasma; TiAlN; microstructure;

机译：电弧等离子体;TiAln;微观结构;

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Effect of varying N_2 pressure on DC arc plasma properties and microstructure of TiAlN coatings

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