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首页> 外文期刊>Journal of the mechanical behavior of biomedical materials >Atomic layer deposition SiO2 films over dental ZrO2 towards strong adhesive to resin
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Atomic layer deposition SiO2 films over dental ZrO2 towards strong adhesive to resin

机译：原子层沉积SiO2在牙科ZrO2上朝向树脂的强粘合剂

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摘要

Atomic layer deposition (ALD) is a self-limiting nanoscale film deposition technology with the advantages of good stability, consistency and conformability. In this study, we proposed to deposit silica (SiO2) films over dental zirconium-oxide (ZrO2) by ALD for better SiO2 films and higher bond strength between ZrO2 and resin. To investigate the superiority of film deposited by ALD, other surface modification methods such as sol-gel, vapor phase hydrolysis and electrostatic self-assembly were compared in terms of the short-term and long-term bond strength between ZrO2 and resin, measured by universal testing machine. Meanwhile, the surface morphology and chemical elemental analysis were characterized by scanning electron microscopy (SEM), energy dispersive spectrometer (EDS) and Fourier transform infrared spectroscopy (FTIR). Results showed that the SiO2 films deposited by ALD or electrostatic self-assembly were uniform and consistent while sol-gel and vapor phase hydrolysis formed SiO2 films with cracks or pores, changing the morphology of ZrO2.ALD had the best results among all methods and increased the bond strength to 16.49 +/- 1.60 MPa and 13.44 +/- 1.63 MPa before and after aging respectively, which is expected to improve the long-term success rate of clinical dental ZrO2 prostheses.
机译：原子层沉积（ALD）是一种自限性纳米薄膜沉积技术，具有良好的稳定性、一致性和一致性。在这项研究中，我们建议通过ALD在牙科氧化锆（ZrO2）上沉积二氧化硅（SiO2）膜，以获得更好的SiO2膜以及ZrO2和树脂之间更高的粘结强度。为了研究ALD沉积薄膜的优越性，通过万能试验机测试了溶胶-凝胶法、气相水解法和静电自组装法等表面改性方法对ZrO2与树脂的短期和长期结合强度进行了比较。同时，用扫描电子显微镜（SEM）、能谱仪（EDS）和傅里叶变换红外光谱（FTIR）对其表面形貌和化学元素分析进行了表征。结果表明，通过ALD或静电自组装方法沉积的SiO2膜均匀一致，而溶胶-凝胶和气相水解形成的SiO2膜具有裂纹或孔隙，改变了ZrO2的形貌。ALD在所有方法中效果最好，老化前后粘结强度分别提高到16.49+/-1.60 MPa和13.44+/-1.63 MPa，有望提高临床牙科ZrO2修复体的长期成功率。

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