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Compact integrator design for short-distance sharp and unconventional geometric irradiance tailoring

机译：紧凑型积分器设计短距离和非传统几何辐照度剪裁

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摘要

A compact microlens array (MLA) integral homogenizer composed of a projection MLA, a condenser MLA, and a subimage array mask based on Kohler illumination is presented herein. By adopting the optimal design of an aspheric projection sublens, a short-distance integrator for unconventional geometric irradiance tailoring can be acquired. Compared with the traditional integrator, the integral lens is removed in the proposed integrator. An incident beam with a larger divergence angle is permitted while a sharp illumination performance is maintained. In addition, the illumination distribution with a predefined geometrical profile can be obtained by introducing a subimage array mask without replacing the MLA elements. Through the introduced mask, the illumination attenuation area is cut, the distortion is caused by the large NA, and the peak effect caused by the integral lens of the traditional integrator can be eliminated. The subimage array mask is generated by combining ray tracing and the radial basis function image warping method. By introducing the array mask into the system, an 80% edge relative illumination and an 85% overall illumination uniformity are realized for a compact large-NA integrator with NA = 0.3 and thickness of 4.5 mm. An 88% edge relative illumination and a 92% overall illumination uniformity are realized for a small-NA integrator with NA = 0.15. (C) 2021 Optical Society of America
机译：本文提出了一种紧凑型微透镜阵列（MLA）积分均匀化器，它由投影MLA、聚光MLA和基于科勒照明的子图像阵列掩模组成。通过采用非球面投影子单元的优化设计，可以获得用于非常规几何辐照度裁剪的短距离积分器。与传统积分器相比，该积分器去掉了积分透镜。允许使用发散角较大的入射光束，同时保持锐利的照明性能。此外，在不替换MLA元件的情况下，通过引入子图像阵列掩模，可以获得具有预定义几何轮廓的照明分布。通过引入掩模，切割了光照衰减区域，消除了大NA引起的畸变，消除了传统积分器积分透镜引起的峰值效应。将光线跟踪和径向基函数图像扭曲方法相结合，生成子图像阵列掩模。通过在系统中引入阵列掩模，对于NA=0.3、厚度为4.5mm的小型大型NA积分器，实现了80%的边缘相对照明和85%的整体照明均匀性。对于NA=0.15的小型NA积分器，实现了88%的边缘相对照明和92%的整体照明均匀性。（2021）美国光学学会

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  • 来源
    《Applied optics》 |2021年第14期|共12页
  • 作者

    Liu Yue; Cheng Dewen; Hou Qichao; Chen Hailong; Feng Zexin; Yang Tong; Wang Yongtian;

  • 作者单位

    Beijing Inst Technol Sch Opt &

    Photon Beijing Engn Res Ctr Mixed Real &

    Adv Displa Beijing 100081 Peoples R China;

    Beijing Inst Technol Sch Opt &

    Photon Beijing Engn Res Ctr Mixed Real &

    Adv Displa Beijing 100081 Peoples R China;

    Beijing Inst Technol Sch Opt &

    Photon Beijing Engn Res Ctr Mixed Real &

    Adv Displa Beijing 100081 Peoples R China;

    Beijing Inst Technol Sch Opt &

    Photon Beijing Engn Res Ctr Mixed Real &

    Adv Displa Beijing 100081 Peoples R China;

    Beijing Inst Technol Sch Opt &

    Photon Beijing Engn Res Ctr Mixed Real &

    Adv Displa Beijing 100081 Peoples R China;

    Beijing Inst Technol Sch Opt &

    Photon Beijing Engn Res Ctr Mixed Real &

    Adv Displa Beijing 100081 Peoples R China;

    Beijing Inst Technol Sch Opt &

    Photon Beijing Engn Res Ctr Mixed Real &

    Adv Displa Beijing 100081 Peoples R China;

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