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Optical constants of sputter-deposited Ti-Ce oxide and Zr-Ce oxide films

机译：溅射沉积Ti-Ce氧化物和Zr-Ce氧化物薄膜的光学常数

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Films of Ti oxide, Zr oxide, Ce oxide, Ti-Ce oxide, and Zr-Ce oxide were made by means of reactive de magnetron sputtering in a multitarget arrangement. The films were characterized by x-ray diffraction and electrochemical measurements, both techniques being firmly connected to stoichiometric information. The optical constants n and k were evalued from spectrophotometry and from variable-angle spectroscopic ellipsometry. The two analyses gave consistent results. It was found that n for the mixed-oxide films varied smoothly between the values for the pure oxides, whereas k in the band-gap range showed characteristic differences between Ti-Ce oxide and Zr-Ce oxide. It is speculated that this difference is associated with structural effects. (C) 1998 Optical Society of America. [References: 55]
机译：通过多靶布置中的反应性磁控管溅射制备Ti氧化物，Zr氧化物，Ce氧化物，Ti-Ce氧化物和Zr-Ce氧化物的膜。薄膜通过X射线衍射和电化学测量来表征，这两种技术都与化学计量信息紧密相关。光学常数n和k由分光光度法和可变角度分光椭圆仪测定。两项分析给出了一致的结果。发现混合氧化物膜的n在纯氧化物的值之间平滑地变化，而在带隙范围内的k显示出Ti-Ce氧化物和Zr-Ce氧化物之间的特性差异。据推测，这种差异与结构效应有关。 （C）1998年美国眼镜学会。 [参考：55]

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