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首页> 外文期刊>Applied optics >EFFECTS OF PROCESS ERRORS ON THE DIFFRACTION CHARACTERISTICS OF BINARY DIELECTRIC GRATINGS
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EFFECTS OF PROCESS ERRORS ON THE DIFFRACTION CHARACTERISTICS OF BINARY DIELECTRIC GRATINGS

机译：过程误差对二元介电光栅衍射特性的影响

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摘要

The effects of fabrication errors on the predicted performance of surface-relief phase gratings are analyzed with a rigorous vector diffraction technique. For binary elements, errors in the dimensions of the profile [depth, linewidth (fill factor), and grating period], as well as errors in the shape of the profile, are investigated. It is shown that the dimension errors do not have a significant effect on grating performance when the grating is designed for either maximum or minimum diffraction efficiency. A trapezoid is used to model the shape error of the profile. For the first time, design rules that significantly reduce the effects of any shape error are presented. [References: 14]
机译：使用严格的矢量衍射技术分析了制造误差对表面浮雕相位光栅的预测性能的影响。对于二元元素，研究了轮廓尺寸的误差[深度，线宽（填充因子）和光栅周期]，以及轮廓形状的误差。结果表明，当光栅设计用于最大或最小衍射效率时，尺寸误差不会对光栅性能产生重大影响。梯形用于模拟轮廓的形状误差。首次提出了显着减少任何形状误差影响的设计规则。 [参考：14]

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