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Polarizing mirror/absorber for visible wavelengths based on a silicon subwavelength grating: design and fabrication

机译:基于硅亚波长光栅的可见光偏振镜/吸收器:设计和制造

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A one-dimensional 280-nm period silicon grating designed to exhibit polarization-dependent reflection or antireflection behavior at visible wavelengths has been fabricated and tested. For normally incident 575-nm light, this grating reflects less than 3% of the incident radiation polarized perpendicular to the grating grooves and approximately 23% of the orthogonal polarization. To demonstrate the grating's broadband characteristics, reflectance measurements are presented over the free-space wavelength range 475 nm < lambda(0) < 800 nm, for angles of incidence in the range 0 degrees < theta < 40 degrees, for polarization parallel and perpendicular to the grating grooves, and for planes of incidence parallel and perpendicular to the grooves. A description of the fabrication process is also given. (C) 1998 Optical Society of America. [References: 39]
机译:设计并测试了设计用于在可见光波长下显示偏振相关的反射或抗反射行为的一维280 nm周期硅光栅。对于法向入射的575 nm光,此光栅反射的入射辐射垂直于光栅凹槽的方向偏振的比例不到3%,而正交偏振的方向约为23%。为了证明光栅的宽带特性,在自由空间波长范围475 nm

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