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Interferometric characterization of subwavelength Iamellar gratings

机译:亚波长层状光栅的干涉测量特性

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摘要

We propose a new, to our knowledge, method for determining the two main critical parameters of periodi one-dimensional lamellar structures, namely, linewidths and etched depths. The method is simple and requires only two measurements for the phase of the zero-transmitted order under two orthogona polarizations. It is inspired by the analogy between subwavelength gratings and anisotropic homoge neous thin films. The method is tested with experimental data obtained with a Mach-Zehnder inter ferometer. Etched depths and linewidths derived from the interferograms and electromagnetic theory are compared with scanning-electron-microscope observations.
机译:据我们所知,我们提出了一种新的方法来确定周期一维层状结构的两个主要关键参数,即线宽和蚀刻深度。该方法很简单,并且在两个正交极化下仅需要两次测量零透射阶的相位。它受到亚波长光栅和各向异性同质新薄膜之间类比的启发。该方法用Mach-Zehnder干涉仪获得的实验数据进行测试。从干涉图和电磁理论得出的蚀刻深度和线宽与扫描电子显微镜观察结果进行了比较。

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