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DEVELOPED PROFILE OF HOLOGRAPHICALLY EXPOSED PHOTORESIST GRATINGS

机译:全息曝光的光致抗蚀剂光栅的发展概况

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摘要

A simulation of the profile of holographically recorded structures in photoresists is performed. In addition to its simplicity this simulation can he used to take into account the effects that arise from exposure, photosensitization, development, and resolution of positive photoresists. We analyzed the effects of isotropy of wet development, nonlinearity of the photoresist response curve, background light, and standing waves produced by reflection at the film-substrate interface by using this simulation, and the results agree with the experimentally recorded profiles. [References: 24]
机译:对光致抗蚀剂中的全息记录结构的轮廓进行模拟。除了简单之外,该模拟还可以用来考虑由正性光刻胶的曝光,光敏性,显影和分辨率引起的影响。通过使用该模拟,我们分析了湿显影的各向同性,光致抗蚀剂响应曲线的非线性,背景光以及在膜-基底界面处反射产生的驻波的影响,结果与实验记录的轮廓吻合。 [参考:24]

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