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首页> 外文期刊>Applied optics >Bragg gratings printed upon thin glass films by excimer laser irradiation and selective chemical etching
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Bragg gratings printed upon thin glass films by excimer laser irradiation and selective chemical etching

机译：通过准分子激光辐射和选择性化学蚀刻在玻璃薄膜上印刷的布拉格光栅

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摘要

Photon-induced property changes of sputter-deposited GeO↓(2)-SiO↓(2) thin glass films were investigated Irradiation with ArF laser pulses induced the changes in refractive index of -10% and volume of +30% in the film without ablation. A Bragg grating with a positive sinusoid wave pattern was printed upon the film by irradiation with ArF excimer laser pulses through a phase mask. The irradiated area could be quickly etched by a HF solution. The ratio of etching rate of irradiated area to unirradiated area was higher than 30. A Bragg grating with a surface relief pattern was successfully formed on the film irradiation with excimer laser pulses followed by chemical etching. Diffraction efficiency of the gratings increased by 25 times with the etching.# 1997 Optical Society of America
机译：研究了溅射沉积的GeO↓（2）-SiO↓（2）薄膜玻璃的光子特性变化。用ArF激光脉冲辐照引起薄膜的折射率变化为-10％，体积变化为+ 30％。消融。通过相位掩模用ArF受激准分子激光脉冲辐照，在膜上印刷正弦波图形的布拉格光栅。可以通过HF溶液快速蚀刻被照射的区域。辐照区与未辐照区的蚀刻速率之比大于30。在用准分子激光脉冲辐照的薄膜上进行化学蚀刻后，成功地形成了具有表面浮雕图案的布拉格光栅。通过蚀刻，光栅的衍射效率提高了25倍。＃1997美国光学学会

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