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首页> 外文期刊>Applied optics >Low-loss dielectric mirror with ion-beam-sputtered TiO_(2)-SiO_(2) mixed films
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Low-loss dielectric mirror with ion-beam-sputtered TiO_(2)-SiO_(2) mixed films

机译：离子束溅射TiO_（2）-SiO_（2）混合膜的低损耗介质镜

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摘要

Ion-beam-sputtered TiO_(2)-SiO_(2) mixed films with 17% SiO_(2) concentration were used as high-refractive-index layers in a multilayered-stack dielectric mirror. Experimental results indicated that total loss of the as-deposited mirror was 34% lower than that of the as-deposited conventional mirrors with pure TiO_(2) films used as high-refractive-index layers. In addition, annealing reduced total loss of the mirrors. Although decreasing with an increasing annealing temperature, total loss of the conventional mirrors dramatically increased above ～200℃ annealing temperature, owing to increased scattering from an amorphous-to-crystalline phase transition in the TiO_(2) films. In addition, total loss of the mirrors with the mixed films continuously decreased with an increasing annealing temperature up to 400℃ without the phase transition. Total loss was reduced 88% by means of decreasing absorption in the mixed films. Moreover, the annealed mirror with mixed films was better than both the as-deposited mirror and the conventional mirror with pure films in terms of laser-damage resistance.
机译：离子束溅射的TiO_（2）-SiO_（2）浓度为17％SiO_（2）的混合膜用作多层堆叠介质镜中的高折射率层。实验结果表明，与纯TiO_（2）薄膜用作高折射率层的常规反射镜相比，初始沉积镜的总损耗低34％。另外，退火减少了镜子的总损耗。尽管随着退火温度的升高，反射镜的总损耗减小，但在〜200℃以上的退火温度下，由于TiO_（2）薄膜中从非晶相向晶体相变的散射增加，总反射镜的总损耗急剧增加。此外，随着混合温度的升高，退火温度升高到400℃，而没有相变，反射镜的总损耗不断降低。通过减少混合薄膜中的吸收，总损耗减少了88％。而且，就抗激光损伤性而言，具有混合膜的退火镜比沉积的镜和传统的具有纯膜的镜都更好。

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