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Polarized light scattering by dielectric and metallic spheres on silicon wafers

机译:硅片上电介质和金属球对偏振光的散射

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摘要

The polarization and intensity of light scattered by monodisperse polystyrene latex and copper spheres, with diameters ranging from 92 to 218 nm, deposited on silicon substrates were measured with 442-, 532-, and 633-nm light. The results are compared with a theory for scattering by a sphere on a surface, originally developed by others [Physica A 137, 209 (1986)], and extended to include coatings on the sphere and the substrate. The results show that accurate calculation of the scattering of light by a metal sphere requires that the near-field interaction between the sphere and its image be included in a complete manner. The normal-incidence approximation does not suffice for this interaction, and the existence of any thin oxide layer on the substrate must be included in the calculation.
机译:用442-,532-和633-nm光测量沉积在硅基板上的直径为92-218 nm的单分散聚苯乙烯胶乳和铜球散射的光的偏振和强度。将该结果与最初由其他人开发的通过球体在表面上散射的理论进行比较[Physica A 137,209(1986)],并扩展到包括球体和基底上的涂层。结果表明,要精确计算金属球的光散射,就需要完整地包括球及其图像之间的近场相互作用。法向入射近似值不足以进行这种相互作用,并且在计算中必须包括基板上任何薄氧化层的存在。

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