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Relative measurements of second-order susceptibility with reflective second-harmonic generation

机译:反射二次谐波产生对二阶磁化率的相对测量

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摘要

There is a strong demand for a simple and reliable technique for second-order susceptibility measurements of thin films. Since the Maker fringe technique is limited to transparent substrates we propose an experimental protocol based on reflective second-harmonic generation (SHG). The proposed protocol is based on relative measurements of Z-cut quartz. An analytical expression of the reflective SHG intensity dependence of the polarizer, analyzer, and sample azimuth is presented. An error analysis is also presented. Thin organic film of the side-chain polymer poly(Disperse Red 1 Methacrylate-Co-Methyl-Methacrylate) is investigated. Results for different wavelengths are reported.
机译:强烈需要一种简单可靠的技术来测量薄膜的二阶磁化率。由于Maker条纹技术仅限于透明基板,因此我们提出了基于反射二次谐波生成(SHG)的实验协议。提议的协议基于Z切石英的相对测量值。给出了偏振器,检偏器和样品方位角反射SHG强度依赖性的解析表达式。还提供了错误分析。研究了侧链聚合物聚(分散红1甲基丙烯酸酯-共-甲基丙烯酸甲酯)的有机薄膜。报告了不同波长的结果。

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