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EXCIMER LASER USE FOR MICROETCHING COMPUTER-GENERATED HOLOGRAPHIC STRUCTURES

机译:准分子激光在微刻蚀计算机生成的全息结构中的使用

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Excimer-laser microetching of a variety of materials is applied to the fabrication of surface-relief optical microstructures of arbitrary morphology, with particular emphasis on computer-generated holographic structures. High-definition, high-radiation-intensity selective laser ablative etching in conjunction with step-and-repeat (period) replication or raster (pixel) scanning is used. To support such developments, the characteristic etching properties of a wide range of solid materials, from metals to semiconductors and polymers, are studied. Optical-interconnect and generic object holograms are produced by means of this alternative one-step holographic information-recording method. (C) 1996 Optical Society of America [References: 44]
机译:多种材料的准分子激光微蚀刻技术被用于制造任意形态的表面浮雕光学微结构,尤其是计算机生成的全息结构。使用高清晰度,高辐射强度的选择性激光烧蚀蚀刻,以及分步重复(周期)复制或光栅(像素)扫描。为了支持这种发展,研究了从金属到半导体和聚合物的各种固体材料的特征蚀刻特性。通过这种另一种单步全息信息记录方法可以产生光学互连和通用对象全息图。 (C)1996年美国眼镜学会[参考文献:44]

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