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Design and manufacture of low-absorption ZnS-YF3 antireflection coatings in the 3.5-16-mu m spectral range

机译:3.5-16微米光谱范围内的低吸收性ZnS-YF3减反射膜的设计与制造

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Broadband antireflection coatings on ZnSe substrates are designed and manufactured in the 3.5-16-mu m IR range. The thin-film materials are YF3 and ZnS produced by electron-beam deposition. To reach optimal performances to as great as 16 mu m, we performed an accurate determination of complex indices, taking into account dispersion laws and absorption due to water within layers. With this knowledge, designs are optimized and absorption is reduced at 16 mu m (C) 1998 Optical Society of America. [References: 13]
机译:ZnSe基板上的宽带抗反射涂层的设计和制造的IR范围为3.5-16微米。薄膜材料是通过电子束沉积产生的YF3和ZnS。为了达到高达16微米的最佳性能,我们考虑了分散规律和层内水分引起的吸收,对复数指数进行了精确测定。有了这些知识,就可以优化设计并减少16微米(C)1998美国光学学会的吸收。 [参考:13]

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