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首页> 外文期刊>Indian Journal of Chemistry, Section A. Inorganic, Physical, Theoretical & Analytical >A study of the underpotential deposited hydrogen on the nickel deposited electrode in alkaine media
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A study of the underpotential deposited hydrogen on the nickel deposited electrode in alkaine media

机译:碱性介质中镍沉积电极上的低电位沉积氢的研究

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摘要

Hydrogen evolution reaction has been studied on the nickel deposited electrode. Two reduction peaks at -1V/Ag-AgCl and-1.3 V/Ag-AgCl and one oxidation peak at -1.3V/Ag-AgCl have been observed. Shift due to oxidation peak arises from change of cathodic limit, attributed to the two competitive reactions on the surface. The peak located on the more anodic side is due to the oxidation of H_UPD and the second peak due to the oxidation of H_OPD. The sodium ion has no effect on the hydrogen evoluation reaction. The diffusion coefficient of hydrogen is calculated to be D = 2.88 X 10~(-10) cm~2 s~(-1) using impedance technique.
机译:已经在镍沉积电极上研究了析氢反应。在-1V / Ag-AgCl和-1.3V / Ag-AgCl处观察到两个还原峰,在-1.3V / Ag-AgCl处观察到一个氧化峰。氧化峰引起的位移是由于阴极极限的变化而引起的,这归因于表面上的两个竞争反应。位于更阳极侧的峰是由于H_UPD的氧化,而第二峰是由于H_OPD的氧化。钠离子对氢逸出反应没有影响。氢的扩散系数采用阻抗技术计算为D = 2.88 X 10〜(-10)cm〜2 s〜(-1)。

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