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首页> 外文期刊>International Journal of Computer Integrated Manufacturing >Strip approximation with Bezier patches in conical form for design and manufacturing of developable materials
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Strip approximation with Bezier patches in conical form for design and manufacturing of developable materials

机译：带锥度的Bezier贴片的带状近似用于可开发材料的设计和制造

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摘要

This article proposes a novel geometric modelling method for strip approximation using developable Bezier patches in the conical form. Given two space curves, a greedy algorithm is applied to generate an aggregate of quadrilateral and triangular patches based on local optimisation of normal variation across the patch boundaries. These patches, only with positional continuity, are degree elevated to produce additional control points for further shape adjustment. G1 continuity is thus created by the extra degrees of freedom obtained from the degree elevation while the surface developability is preserved. An adaptive refinement algorithm is introduced to minimise the deviation between the boundaries of the approximation patches and the given curves. The experimental results of test examples demonstrate the advantages of the proposed method, which provides flexible modelling capability with quadrilateral and triangular patches, approximates with high-order patches and allows error control in the approximation. This work offers an effective approach for design and manufacturing of developable materials.
机译：本文提出了一种新颖的几何建模方法，用于使用圆锥形形式的可开发Bezier面片进行条带逼近。给定两个空间曲线，基于跨补丁边界的法向变化的局部优化，应用贪婪算法来生成四边形和三角形补丁的集合。仅在位置连续的情况下，将这些贴片提升一定程度，以产生其他控制点以进一步调整形状。因此，G1的连续性是通过从度数提升中获得的额外自由度来创建的，同时保留了表面可显影性。引入了一种自适应细化算法，以最小化逼近面片和给定曲线的边界之间的偏差。测试示例的实验结果证明了该方法的优点，该方法提供了具有四边形和三角形补丁的灵活建模功能，具有高阶补丁的近似能力，并允许在近似中进行误差控制。这项工作为可开发材料的设计和制造提供了有效的方法。

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