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首页> 外文期刊>International Journal of Machine Tools & Manufacture: Design, research and application >Robotic polishing of precision molds with uniform material removal control
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Robotic polishing of precision molds with uniform material removal control

机译：机械手抛光精密模具，具有统一的材料去除控制

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摘要

In this paper, a uniform material removal (UMR) model is proposed for an automatic mold polishing system (AMPS). Free-form surfaces of mold geometry in IGES format are read and regenerated by the AMPS using the NURBS model. The normal vector, the principal curvatures, and the effective contact area are calculated at any point on the surface. The sensitivity of each factor that influences the material removal is determined by Taguchi experiments. The UMR model is based on maintaining constant velocity and contact pressure by controlling the polishing force according to the effective contact area. Three optical molds were polished using two path patterns with and without UMR control for comparison. The experimental results showed that even the conventional constant-force polishing scheme can achieve nearly the same surface roughness; the surface profile error of the mold with UMR control is less than 1/3 of the mold without UMR control. In addition, the actual material removal depth is less than 5.4% of error compared to the predicted value by the UMR model.
机译：本文提出了一种用于自动模具抛光系统（AMPS）的均匀材料去除（UMR）模型。 AMPS使用NURBS模型读取并重新生成IGES格式的模具几何形状的自由曲面。法线矢量，主曲率和有效接触面积是在表面上的任意点计算的。通过田口实验确定影响材料去除的每个因素的敏感性。 UMR模型基于通过根据有效接触面积控制抛光力来保持恒定的速度和接触压力。为了比较，使用具有和不具有UMR控制的两个路径图案对三个光学模具进行了抛光。实验结果表明，即使是传统的恒力抛光方案，也可以达到几乎相同的表面粗糙度。使用UMR控制的模具的表面轮廓误差小于不使用UMR控制的模具的1/3。此外，与UMR模型的预测值相比，实际材料去除深度小于误差的5.4％。

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