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首页> 外文期刊>International journal of nanoscience >EVOLUTION AND ORDERING OF MULTILAYER Ge QUANTUM DOTS ON Si(001)
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EVOLUTION AND ORDERING OF MULTILAYER Ge QUANTUM DOTS ON Si(001)

机译:Si(001)上多层锗量子点的演化和有序化

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摘要

Evolution and ordering of multilayer Ge islands (up to 14 layers) on Si(00l), prepared by physical vapor deposition at about 550℃; were studied using Scanning Tunneling Microscope (STM), In the growth process, it was observed that long huts split during the deposition of Si buffer layer. It can be explained as a consequence of strain due to lattice mismatch and intermixing of Si and Ge to form solid solution. Such a mechanism of splitting could lead the dots to order and uniformity in the subsequent layers. Apart from splitting of huts, the surface corrugation of Si spacer layer influences the nucleation of Ge islands in the next layer.
机译:在约550℃下通过物理气相沉积制备的Si(00l)上多层Ge岛(最多14层)的演化和有序性;用扫描隧道显微镜(STM)进行了研究,在生长过程中,观察到长的小屋在硅缓冲层的沉积过程中裂开了。可以解释为由于晶格失配以及Si和Ge混合形成固溶体而引起的应变的结果。这种分裂机制可能会导致点在后续层中变得有序和均匀。除小屋分裂外,Si间隔层的表面波纹还会影响下一层中Ge岛的形核。

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