Properties of Multilayer and Alloyed PVD Films on the Base of TiN

Andrievski R.A.author_name/

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Properties of Multilayer and Alloyed PVD Films on the Base of TiN

机译：基于TiN的多层和合金PVD薄膜的性能

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The multilayer and alloyed films of TiN, ZrN, NbN and CrN produced by arc deposition were investigated with use of X-ray diffraction, electron microscopy and microhardness measurements. A general tendency of the microhardness to increase with decreasing layer thickness was found in TiN-NbN(ZrN) systems. The microhardness maximum value (~8000 HV 0.1) was formed in TIN-NbN multilayer films. The influence of spinodal decomposition, recrystallization, and heterodiffusion on the films' microhardness is also demonstrated.

机译：利用X射线衍射，电子显微镜和显微硬度测量研究了电弧沉积产生的TiN，ZrN，NbN和CrN的多层和合金膜。在TiN-NbN（ZrN）系统中发现了随着层厚度的减小而增加的显微硬度的一般趋势。在TIN-NbN多层膜中形成了显微硬度最大值（〜8000 HV 0.1）。还证明了旋节线分解，再结晶和异质扩散对薄膜显微硬度的影响。

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《International Journal of Refractory Metals & Hard Materials》 |1996年第3期|共3页
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Andrievski R.A.author_name/;
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中图分类有色金属及其合金;
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Properties of Multilayer and Alloyed PVD Films on the Base of TiN

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