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首页> 外文期刊>International Journal of Solids and Structures >Effects of strain field on light in crack opening interferometry
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Effects of strain field on light in crack opening interferometry

机译：开裂干涉法中应变场对光的影响

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Crack opening interferometry is a standard technique used to measure the normal opening displacement profile of a crack in a transparent material. This paper calculates how much an incident light ray deflects from a nominally straight line path due to strain induced changes in the index of refraction. It is shown that an incident plane wavefront of light that propagates toward a plane strain crack is split into two linearly polarized light rays: one polarized in a direction parallel to the crack front; the other polarized in the plane perpendicular to the crack front. Assuming linear, elastic mechanical behavior and linear optical behavior in a homogeneous, isotropic medium, the index of refraction of both wavefronts is derived for a Mode I crack in the K-field region. In general, the index of refraction is anisotropic and inhomogeneous. Four new material parameters are identified which characterize crack opening interferometry; values are tabulated for three materials. Using geometrical optics, the paths of both light rays are calculated analytically for a special set of initial conditions and an expression for the total light deflection at the crack flank is obtained. The results show that for some materials and specimen geometries, the absolute deflection of each light,ray is large enough to be measured, but the relative deflection (i.e. the difference in deflection between the two light rays) is too small to be measured. The main effect that this phenomenon has on crack opening interferometry is to cause a shift in the apparent position of the crack tip. It is shown that this shift will not affect the interpretation of the interference fringes in terms of crack opening displacement. (C) 1997 Elsevier Science Ltd. [References: 12]
机译：裂纹开口干涉法是一种标准技术，用于测量透明材料中裂纹的正常开口位移轮廓。本文计算了由于应变引起的折射率变化而导致的入射光线从名义直线路径偏转的程度。结果表明，向平面应变裂纹传播的光的入射平面波前被分成两条线性偏振的光线：一个在平行于裂纹前沿的方向上偏振;另一个在垂直于裂纹前沿的方向上偏振。另一个在垂直于裂纹前沿的平面上极化。假设在均质各向同性的介质中具有线性，弹性机械行为和线性光学行为，则可以得出K场区域中的I型裂纹的两个波阵面的折射率。通常，折射率是各向异性的并且是不均匀的。确定了四个新的材料参数，这些参数表征了裂纹开口干涉法;表中列出了三种材料的值。使用几何光学，可以针对一组特殊的初始条件解析地计算两条光线的路径，并获得裂纹侧面总光偏转的表达式。结果表明，对于某些材料和样品几何形状，每种光线的绝对偏转都足够大，可以测量，但是相对偏转（即两条光线之间的偏转差异）太小而无法测量。此现象对裂纹开口干涉的主要影响是导致裂纹尖端的表观位置发生偏移。结果表明，这种位移不会影响裂纹在开裂位移方面的解释。 （C）1997 Elsevier Science Ltd. [参考：12]

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