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首页> 外文期刊>Electrocatalysis >Ammonia Oxidation at Electrochemically Platinum-Modified Microcrystalline and Polycrystalline Boron-Doped Diamond Electrodes
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Ammonia Oxidation at Electrochemically Platinum-Modified Microcrystalline and Polycrystalline Boron-Doped Diamond Electrodes

机译：化学修饰铂修饰的微晶和多晶掺硼金刚石电极上的氨氧化

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摘要

The electrochemical oxidation of ammonia was done at electrochemically Pt-modified microcrystalline and polycrystalline boron-doped diamond (BDD) thin films from sp(3) Diamond Technologies and Element Six. The Pt electrodepositions were done by chronoamperometry and cyclic voltammetry using a 1 mM K2PtCl6 solution in 0.5 M H2SO4. The Pt-BDD electrodes were characterized by X-ray photoelectron spectroscopy, Raman spectroscopy, X-ray diffraction, and cyclic voltammetry. The Pt-BDD electrodes were compared by SEM and ammonia oxidation. At BDD electrodes, cyclic voltammetry depositions favors the formation of cubic and cauliflower Pt nanostructures at microcrystalline and polycrystalline BDD electrodes, respectively. On the other hand, chronoamperometry electrodeposition favors dendrite formation structures in both BDD electrodes. Platinum electrodeposited by chronoamperometry favors the formation of platinum (100) facets, which enhances ammonia oxidation. Pt-microcrystalline BDD showed the highest ammonia oxidation peak current densities when compared to Pt-polycrystalline BDD.
机译：氨的电化学氧化是在sp（3）Diamond Technologies和Element Six的电化学修饰的Pt改性微晶和多晶掺硼金刚石（BDD）薄膜上进行的。通过计时安培法和循环伏安法使用0.5 m H2SO4中的1 mM K2PtCl6溶液进行Pt电沉积。通过X射线光电子能谱，拉曼光谱，X射线衍射和循环伏安法对Pt-BDD电极进行了表征。通过SEM和氨氧化比较了Pt-BDD电极。在BDD电极上，循环伏安法沉积有利于分别在微晶和多晶BDD电极上形成立方和菜花Pt纳米结构。另一方面，计时电流电沉积有利于两个BDD电极中的枝晶形成结构。通过计时电流法电沉积的铂有利于铂（100）晶面的形成，从而增强氨氧化。与Pt多晶BDD相比，Pt微晶BDD显示出最高的氨氧化峰值电流密度。

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