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首页> 外文期刊>Materials transactions >Effect of Deposition Conditions on the Structure and Properties of CrA1N Films Prepared by Pulsed DC Reactive Sputtering in FTS Mode at High Al Content
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Effect of Deposition Conditions on the Structure and Properties of CrA1N Films Prepared by Pulsed DC Reactive Sputtering in FTS Mode at High Al Content

机译：沉积条件对高铝含量FTS模式脉冲直流反应溅射制备CrA1N薄膜结构和性能的影响

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CrAlN films were prepared by a pulsed DC magnetron sputtering in FTS mode with Cr-Al alloy targets (Cr/Al = 30 at percent/70 at percent) in a mixed atmosphere of Ar and N_2. Effects of different deposition conditions (frequency, duty cycle, nitrogen flow rate and pulsed DC power) on the films structure and phase formation have been investigated. XRD analyses were carried out to determine the phases of the films. The surface morphology was observed using FE-SEM. Transmission electron microscopy studies were carried out for selected films. In order to investigate the relationship between the mechanical properties and microstructure of the films, the hardness was measured by a nanoindentation system. All films exhibited mixture of fcc-CrN and hcp-AlN structures with changing the sputtering conditions. With increasing pulse frequency, the relative percent of fcc-CrN phase decreased from approx 100 percent to approx 20 percent. In the current study it was found that there is an optimal duty cycle (around 82 percent) where the fcc-CrN relative percent reaches to its highest value (about 98 percent). On the other hand, grain size of the films kept in the range of 20-25 nm below 82 percent of duty cycle, then increased up to approx 50 nm with increasing duty cycle. Changing the nitrogen flow rate affected the fcc-CrN relative percent and films morphology. Under optimal nitrogen flow rate, fcc-CrN relative percent reached to about 100 percent in addition to the formation of micro columnar morphology, which resulted in the highest plastic hardness of the films. It seems that the mechanical properties of the CrAIN films are directly influenced not only by fcc/hcp phase ratio, but also by morphology. These results suggest that the dominant fcc-CrN phase and high hardness of CrAIN films containing high Al content (Cr : Al = 3 : 7) can be obtained under the restricted condition by the pulsed DC magnetron sputtering in FTS mode.
机译：CrAlN薄膜是通过在FTS模式下用脉冲直流磁控溅射法在Ar和N_2的混合气氛中以Cr-Al合金靶材（Cr / Al = 30 at％/ 70 at％）制备的。研究了不同沉积条件（频率，占空比，氮气流速和脉冲直流功率）对薄膜结构和相形成的影响。进行XRD分析以确定膜的相。使用FE-SEM观察表面形态。对选定的膜进行了透射电子显微镜研究。为了研究膜的机械性能和微观结构之间的关系，通过纳米压痕系统测量硬度。在改变溅射条件的情况下，所有膜均显示出fcc-CrN和hcp-AlN结构的混合物。随着脉冲频率的增加，fcc-CrN相的相对百分比从大约100％降低到大约20％。在当前的研究中，发现有一个最佳占空比（约82％），其中fcc-CrN相对百分比达到其最高值（约98％）。另一方面，薄膜的晶粒尺寸保持在低于占空比82％的20-25 nm范围内，然后随着占空比的增加而增加到约50 nm。改变氮气流量会影响fcc-CrN相对百分比和薄膜形态。在最佳氮气流量下，fcc-CrN相对百分率达到了约100％，此外还形成了微圆柱状形态，这导致了薄膜的最高塑性硬度。似乎CrAIN膜的机械性能不仅直接受fcc / hcp相比的影响，而且还受到形貌的直接影响。这些结果表明，在有限的条件下，通过以FTS模式进行的脉冲直流磁控溅射，可以获得占主导地位的fcc-CrN相和高Al含量（Cr：Al = 3：7）的CrAIN膜的高硬度。

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