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Structural and Mechanical Analysis of APCVD Deposited Diamond-Like Carbon Thin Films

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In this study, diamond-like Carbon (DLC) thin film coatings are deposited by atmospheric pressure chemical vapour deposition (APCVD) process by using C(2)H(2)and H(2)as precursor gases on SiO(2)substrates. The morphological, structural, mechanical and composition of the DLC thin film coatings are studied by using field emission scanning electron microscopy (FESEM), Raman spectroscopy, nanoindentation, Fourier-transform infrared spectroscopy (FTIR) and X-ray photoelectron spectroscopy (XPS). Irrespective of the varying H(2)flow rate, smooth surfaces of the thin film coatings are observed in the FESEM images. The Young's modulus (E) and hardness (H) of the DLC coating increases with an increase in H(2)flow rate and the maximum E and H are observed as 193.97 GPa and 22.46 GPa respectively. Due to the SiO(2)buffer layer, the residual stress (sigma) of the film significantly decreased to a minimum of 1.05 GPa which is much less as compared to the DLC film deposited over the Si substrate. The percentage of sp3 can be calculated from the XPS and it is 58.68 and 70 for the flow rate of H(2)of 0 and 80 sccm respectively. The effect of H(2)flow rate on the morphology, structural, mechanical and composition of the DLC thin film coatings are analyzed and discussed thoroughly along with mechanics behind it.

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