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Current limitations of SEM and AFM metrology for the characterization of 3D nanostructures

机译：SEM和AFM计量学在表征3D纳米结构方面的当前局限性

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摘要

This contribution discusses the developed approaches as well as the limitations of scanning electron microscopy (SEM) and atomic force microscopy (AFM) to measure topographic details of structures on lithographic masks and wafers aiming at uncertainties in the nanometre range or even below. In the first approximation, the SEM signal, that is the change of secondary electron (SE) yield, is interpreted as being due to the surface tilt contrast and SE diffusion from the sidewall. The signal is biased by the width of the initial electron beam and, in the case of smaller penetration depths of the initial electron beam, also by the corner rounding of the specimen. Oscillation mode AFMs have been operated such that steep edge regions could be resolved better than with standard scanning methods. A single-point probing strategy enables the instrument to approach the surface from any direction and to leave the probe in the interaction region for a minimum of time maintaining the tip geometry. The ambiguity of the AFM measurement due to the changing response behaviour of the oscillating probe at differing geometries is discussed.
机译：该文稿讨论了开发的方法以及扫描电子显微镜（SEM）和原子力显微镜（AFM）的局限性，以测量光刻掩模和晶圆上结构的形貌细节，旨在达到纳米范围甚至更低的不确定性。在第一近似中，SEM信号，即二次电子（SE）产量的变化，被解释为归因于表面倾斜对比度和SE从侧壁的扩散。信号被初始电子束的宽度偏置，并且在初始电子束穿透深度较小的情况下，还被样本的圆角偏置。振荡模式原子力显微镜的操作方式使陡峭边缘区域的分辨率比标准扫描方法更好。单点探测策略使仪器可以从任何方向接近表面，并将探针留在相互作用区域中，保持最短的时间，以保持尖端的几何形状。讨论了由于振荡探针在不同几何形状下变化的响应行为而导致的AFM测量的不确定性。

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