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首页> 外文期刊>Measurement Science & Technology >Quantitative assessment of slit Mura defect in a thin film transistor-liquid crystal display based on chromaticity and optical density
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Quantitative assessment of slit Mura defect in a thin film transistor-liquid crystal display based on chromaticity and optical density

机译:基于色度和光密度的薄膜晶体管液晶显示器中狭缝Mura缺陷的定量评估

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摘要

An innovative non-contact optical inspection method is developed to quantify slit Mura defects for thin film transistor-liquid crystal displays (TFT-LCDs). From the measurements of both chromaticity and optical densities across the slit Mura, the results indicate that the optical density profile is a concave shape and the chromaticity distribution is a convex shape. A linear relation with a negative slope exists between the chromaticity and optical density. A larger colour difference has a steeper slope, and vice versa. All of the measurements with uncertainties of a 99.7percent confidence interval satisfy the requirements of the flat panel display industry. The proposed method can accurately quantify the pattern of blue slit Mura of TFT-LCDs; even the perceptibility is below the just noticeable difference.
机译:开发了一种创新的非接触式光学检查方法,以量化薄膜晶体管-液晶显示器(TFT-LCD)的狭缝Mura缺陷。从横跨狭缝Mura的色度和光密度的测量结果表明,光密度分布为凹形,色度分布为凸形。在色度和光密度之间存在负斜率的线性关系。较大的色差具有较陡的斜率,反之亦然。不确定性在99.7%的置信区间内的所有测量均满足平板显示器行业的要求。该方法可以准确地量化TFT-LCD的蓝缝Mura的图案。即使可感知性也低于恰到好处的差异。

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