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Edge transfer lithography using alkanethiol inks

机译:使用链烷硫醇油墨的边缘转移光刻

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摘要

Edge lithographic patterning techniques are based on the utilization of the edges of micrometer-sized template features for the reproduction of submicrometer structures. Edge transfer lithography (ETL) permits local surface modification in a single step by depositing self-assembled monolayers onto a metal substrate selectively along the feature edges of an elastomeric stamp. In this report two stamp designs are described that now allow for the use of alkanethiol inks in ETL and their use as etch resists to reproduce submicrometer structures in gold. Anisotropically modified stamps are shown to combine the potential for very high-resolution patterning with the versatility and simplicity of microcontact printing.
机译:边缘光刻构图技术基于对微米级模板特征边缘的利用,以再现亚微米结构。边缘转移光刻(ETL)通过将自组装单分子层选择性地沿着弹性体印模的特征边缘沉积到金属基板上,从而在单个步骤中进行局部表面修饰。在本报告中,描述了两种印章设计,现在可以在ETL中使用链烷硫醇油墨,并可以将其用作抗蚀剂以复制金的亚微米结构。各向异性改性的印模显示出结合了非常高分辨率图案的潜力以及微接触印刷的多功能性和简便性。

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