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Correlating Raman Spectral Signatures with Carrier Mobility in Epitaxial Graphene: A Guide to Achieving High Mobility on the Wafer Scale

机译:外延石墨烯中拉曼光谱签名与载流子的相关性:在晶圆级实现高迁移率的指南

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摘要

We report a direct correlation between carrier mobility and Raman topography of epitaxial graphene (EG) grown on silicon carbide (SiC). We show the Hall mobility of material on SiC(0001) is highly dependent on thickness and monolayer strain uniformity. Additionally, we achieve high mobility epitaxial graphene (18100 cm(2)/(V s) at room temperature) on SiC(000 (1) over bar) and show that carrier mobility depends strongly on the graphene layer stacking.
机译:我们报道了在碳化硅(SiC)上生长的外延石墨烯(EG)的载流子迁移率和拉曼形貌之间的直接关系。我们表明,SiC(0001)上材料的霍尔迁移率高度依赖于厚度和单层应变均匀性。此外,我们在SiC(000(1)以上,在条形上)上实现了高迁移率外延石墨烯(室温下为18100 cm(2)/(V s)),并表明载流子迁移率强烈依赖于石墨烯层的堆叠。

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