In situ real-time monitoring of changes in the surface roughness during nonadiabatic optical near-field etching

Yatsui T.; Hirata K.; Tabata Y.; Nomura W.; Kawazoe T.; Naruse M.; Ohtsu M.

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In situ real-time monitoring of changes in the surface roughness during nonadiabatic optical near-field etching

机译：非绝热光学近场蚀刻过程中表面粗糙度变化的原位实时监测

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We performed in situ real-time monitoring of the change in surface roughness during self-organized optical near-field etching. During near-field etching of a silica substrate, we detected the scattered light intensity from a continuum wave (CW) laser (λ = 633 nm) in addition to the etching CW laser (λ = 532 nm) light source. We discovered that near-field etching not only decreases surface roughness, but also increases the number of scatterers, as was confirmed by analyzing the AFM image. These approaches provide optimization criteria for the etching parameter and hence for further decreases in surface roughness.

机译：我们对自组织光学近场蚀刻过程中表面粗糙度的变化进行了原位实时监测。在二氧化硅基板的近场蚀刻过程中，除了蚀刻CW激光器（λ= 532 nm）光源外，我们还检测到来自连续波（CW）激光器（λ= 633 nm）的散射光强度。我们发现，近场蚀刻不仅降低了表面粗糙度，而且还增加了散射体的数量，这一点已通过分析AFM图像得到证实。这些方法为蚀刻参数提供了最佳标准，因此可以进一步降低表面粗糙度。

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《Nanotechnology》 |2010年第35期|共5页
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Yatsui T.; Hirata K.; Tabata Y.; Nomura W.; Kawazoe T.; Naruse M.; Ohtsu M.;
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1. In situ real-time monitoring of changes in the surface roughness during nonadiabatic optical near-field etching [J] . Yatsui T., Hirata K., Tabata Y., Nanotechnology . 2010,第35期

机译：非绝热光学近场蚀刻过程中表面粗糙度变化的原位实时监测
2. Realization of an ultra-flat silica surface with angstrom-scale average roughness using nonadiabatic optical near-field etching [J] . T. Yatsui, K. Hirata, W. Nomura, Applied physics . 2008,第1期

机译：使用非绝热光学近场刻蚀实现具有埃级平均粗糙度的超平二氧化硅表面
3. Simultaneous monitoring of biofilm growth, microbial activity, and inorganic deposits on surfaces with an in situ, online, real-time, non-destructive, optical sensor [J] . Martin Strathmann, Klaus-Henrik Mittenzwey, Gert Sinn, Biofouling . 2013,第5a6期

机译：使用原位，在线，实时，无损光学传感器同时监控生物膜的生长，微生物活性和表面上的无机沉积物
4. Photochemical polishing of sapphire substrate based on nonadiabatic optical near-field etching [C] . Suzuki J., Hirata K., Iwami K., International Conference on Optical MEMS and Nanophotonics . 2013

机译：基于非绝热光学近场刻蚀的蓝宝石衬底光化学抛光
5. In-situ monitoring of reactive ion etching using a surface micromachined integrated resonant sensor. [D] . Morris, Bryan George Oneal. 2009

机译：使用表面微机械集成谐振传感器对反应离子蚀刻进行原位监测。
6. An In-situ Real-Time Optical Fiber Sensor Based on Surface Plasmon Resonance for Monitoring the Growth of TiO2 Thin Films [O] . Yu-Chia Tsao, Woo-Hu Tsai, Wen-Ching Shih, 2013

机译：基于表面等离子共振的原位实时光纤传感器用于监测TiO2薄膜的生长
7. An In-situ Real-Time Optical Fiber Sensor Based on Surface Plasmon Resonance for Monitoring the Growth of TiO2 Thin Films [O] . Wen-Ching Shih, Mu-Shiang Wu, Woo-Hu Tsai, 2013

机译：基于表面等离子共振的原位实时光纤传感器用于监测TiO2薄膜的生长
8. Optical Surface Roughness and Selective Etching of Interdendritic Rexillium III Phases(s) [R] . Kelly, J. R., Thompson, V. P. 1985

机译：枝晶间Rexillium III相的光学表面粗糙度和选择性蚀刻

In situ real-time monitoring of changes in the surface roughness during nonadiabatic optical near-field etching

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