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首页> 外文期刊>Nanotechnology >Plasma enhanced chemical vapour deposition carbon nanotubesanofibres-how uniform do they grow?
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Plasma enhanced chemical vapour deposition carbon nanotubesanofibres-how uniform do they grow?

机译：等离子体增强化学气相沉积碳纳米管/纳米纤维-它们如何均匀生长？

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摘要

The ability to grow carbon nanotubesanofibres (CNs) with a high degree of uniformity is desirable in many applications. In this paper, the structural uniformity of CNs produced by plasma enhanced chemical vapour deposition is evaluated for field emission applications. When single isolated CNs were deposited using this technology, the structures exhibited remarkable uniformity in terms of diameter and height (standard deviations were 4.1 and 6.3 percent respectively of the average diameter and height). The lithographic conditions to achieve a high yield of single CNs are also discussed. Using the height and diameter uniformity statistics, we show that it is indeed possible to accurately predict the average field enhancement factor and the distribution of enhancement factors of the structures, which was confirmed by electrical emission measurements on individual CNs in an array.
机译：在许多应用中期望具有高度均匀性的生长碳纳米管/纳米纤维（CN）的能力。在本文中，通过等离子体增强化学气相沉积产生的CNs的结构均匀性被评估用于场发射应用。当使用此技术沉积单个孤立的CN时，结构在直径和高度方面显示出显着的均匀性（标准偏差分别为平均直径和高度的4.1％和6.3％）。还讨论了实现高产率的单个CN的光刻条件。使用高度和直径均匀性统计数据，我们表明确实有可能准确预测结构的平均场增强因子和增强因子的分布，这已通过对阵列中各个CN进行电发射测量得到了证实。

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