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Electrophoretic deposition of ZnO nanoparticles, from micropatterns to substrate coverage

机译：ZnO纳米颗粒的电泳沉积，从微图案到基底覆盖

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We report on an electrophoretic deposition (EPD) method that is suited for the preparation of both ZnO thin films and micropatterns. By applying small DC voltages between a Cu electrode and a conductive Si substrate, submersed in a suspension of ZnO quantum dots, we can cover entire substrates with ZnO layers of a tuneable thickness ranging from a few monolayers to 200 nm. The deposition occurs selectively at the cathode, which indicates that the ZnO particles have a positive charge. Atomic force microscopy was used to study the influence of the deposition voltage, time, and the quantum dot concentration on the final layer thickness. By using lithographically patterned Si substrates, the same technique enables the formation of ZnO micropatterns of variable thickness with dimensions down to 5 mu m. This is done by depositing a ZnO layer on a Si substrate that is covered with a patterned, developed photoresist. After EPD, the resist is removed by submersing the substrate in the appropriate solvent without damaging the ZnO deposit. This illustrates the robustness of the layers obtained by EPD.
机译：我们报告了一种电泳沉积（EPD）方法，该方法适用于ZnO薄膜和微图案的制备。通过在浸入ZnO量子点悬浮液的Cu电极和导电Si衬底之间施加较小的DC电压，我们可以在整个衬底上覆盖ZnO层，其ZnO层的可调厚度范围是几个单层到200 nm。沉积选择性地发生在阴极，这表明ZnO颗粒具有正电荷。原子力显微镜用于研究沉积电压，时间和量子点浓度对最终层厚度的影响。通过使用光刻图案化的Si基板，相同的技术可以形成厚度可变至5μm的厚度可变的ZnO微图案。这是通过在覆盖有图案化显影光刻胶的Si衬底上沉积ZnO层来完成的。 EPD之后，通过将基材浸没在适当的溶剂中而不会损坏ZnO沉积层来去除抗蚀剂。这说明了通过EPD获得的层的坚固性。

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