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首页> 外文期刊>Nanotechnology >Electro-oxidative nanopatterning of silane monolayers on boron-doped diamond electrodes
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Electro-oxidative nanopatterning of silane monolayers on boron-doped diamond electrodes

机译：掺硼金刚石电极上硅烷单层的电氧化纳米构图

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摘要

Oxidized boron-doped diamond (BDD) electrodes were coated with a monolayer of n-octadecyltrichlorosilane as well as of other silanes. Scanning force microscopy was applied to pattern these monolayers, utilizing doped diamond-coated conductive probes. Patterns were generated on the nanometer scale, and conditions for the patterning process were quantified with regard to humidity and potential bias. It was observed that a sample bias of 3-3.5 V and a relative humidity > 70% are necessary to generate reproducible and stable patterns. At potentials and relative humidities below these values, no or incomplete removal of the monolayer occurred. The results show that electro-oxidative patterning is an expedient way for the generation of nanostructures on chemically modified BDD.
机译：氧化硼掺杂的金刚石（BDD）电极涂有单层的正十八烷基三氯硅烷以及其他硅烷。利用掺杂金刚石涂层的导电探针，应用扫描力显微镜对这些单层进行图案化。在纳米级上产生图案，并且关于湿度和电势偏差来量化图案化过程的条件。观察到，必须产生3-3.5 V的样品偏压和相对湿度> 70％，才能产生可​​再现和稳定的图案。在低于这些值的电势和相对湿度下，未发生单层去除或单层去除不完全。结果表明，电氧化图案化是在化学修饰的BDD上生成纳米结构的简便方法。

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