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Heterostructures of germanium nanowires and germanium-silicon oxide nanotubes and growth mechanisms

机译:锗纳米线和锗硅氧化物纳米管的异质结构及其生长机理

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We report on a method to fabricate one-dimensional heterostructures of germanium nanowires (GeNWs) and germanium—silicon oxide nanotubes (GeSiO,NTs). The synthesis of the wire—tube heterostructures is carried out using a simple furnace set-up with germanium tetraiodide and germanium powders as growth precursors, gold-dotted silicon wafers as substrates and by controlling the temperature ramp rate/sequence of the growth precursors. Two types of wire—tube heterostructures resulting from distinct growth mechanisms are obtained.The type-1 heterostructure consists of a GeNW, grown via a gold-catalyzed vapour—liquid—solid process, at the lower end and a GeSiO,NT at the upper end. In contrast, the type-2 heterostructure is made up of a solid wire at the upper end and a hollow tube at the lower end.The solid wire portion of the type-2 heterostructure is formed through an oxide-assisted growth process.
机译:我们报告了一种制造锗纳米线(GeNWs)和锗-氧化硅纳米管(GeSiO,NTs)的一维异质结构的方法。线-管异质结构的合成是使用简单的炉子装置进行的,其中以四碘化锗和锗粉为生长前驱体,点金的硅片为衬底,并控制温度上升速率/生长前驱体的顺序。获得了两种由不同的生长机理导致的线-管异质结构。1型异质结构由通过金催化的气-液-固过程在下端生长的GeNW和在上端的GeSiO,NT组成。结束。相比之下,2型异质结构由上端的实心线和下端的空心管组成.2型异质结构的实心线部分是通过氧化物辅助生长工艺形成的。

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