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Ordered growth and local workfunction measurements of tris(8-hydroxyquinoline) aluminium on ultrathin KBr films U ZERWECK

机译:三(8-羟基喹啉)铝在超薄KBr薄膜上的有序生长和局部功函数测量U ZERWECK

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摘要

In this work we investigate the growth of tris(8-hydroxyquinoline) aluminium (Alq_3) on single-crystal Ag(111) substrates partially covered by an ultrathin KBr film. Noncontact atomic force microscopy is used to determine the molecular ordering of 0.8 monolayer Alq_3 evaporated onto these substrates. The simultaneous measurement of the local surface potential by means of Kelvin probe force microscopy yields the local workfunction difference between the pure Ag(111) surface and the one covered by an ultrathin KBr film, by pure Alq_3, or by both (KBr|Alq_3). The molecular ordering and the interface dipole formation are discussed with respect to experiments described in the literature in which electron diffraction and photoelectron spectroscopy were used, respectively.
机译:在这项工作中,我们研究了三(8-羟基喹啉)铝(Alq_3)在部分被超薄KBr膜覆盖的单晶Ag(111)衬底上的生长。非接触原子力显微镜用于确定蒸发到这些基板上的0.8个单层Alq_3的分子顺序。通过开尔文探针力显微镜同时测量局部表面电势会产生纯Ag(111)表面与被超薄KBr膜,纯Alq_3或两者覆盖的表面(KBr | Alq_3)之间的局部功函数差。 。关于文献中描述的使用电子衍射和光电子能谱的实验分别讨论了分子有序和界面偶极子的形成。

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