首页> 外文期刊>Nanotechnology >Fabrication of monocrystalline refractory metal nanostructures capable of ballistic electron transport
【24h】

Fabrication of monocrystalline refractory metal nanostructures capable of ballistic electron transport

机译:具有弹道电子传输能力的单晶难熔金属纳米结构的制备

获取原文
获取原文并翻译 | 示例
           

摘要

Refractory metal monocrystalline nanostructures with spatial resolution up to 200 nm are fabricated by subtractive electron lithography and Al mask patterning of epitaxial refractory metal films. The size (width) effect on electrical properties of bridge-type metallic nanostructures with residual electron mean-free paths 200-500 nm is observed for the first time. It is also found that the change of the positive sign of electrical bending resistance at room temperature to the negative one at helium temperature proves the realization of the ballistic limit in electron transport in cross-type nanostructures. The effect of both ion etching and thermal annealing of nanostructures is also investigated. [References: 14]
机译:通过减法电子光刻和外延难熔金属膜的Al掩模构图,制造了空间分辨率高达200 nm的难熔金属单晶纳米结构。首次观察到具有剩余电子均值自由路径为200-500 nm的桥型金属纳米结构的电性能的尺寸(宽度)影响。还发现,室温下的耐电弯曲性的正号变为氦气温度下的负性,证明了在交叉型纳米结构中实现了电子传输的弹道极限。还研究了离子刻蚀和纳米结构热退火的效果。 [参考:14]

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号