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Fabrication of conductive wires by electron-beam-induced deposition

机译:通过电子束诱导沉积制备导线

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Conductive wires are fabricated by electron-beam-induced deposition. In fabrication, the deposition property of the beam-induced process has been demonstrated using rate equations describing precursor molecule supply and consumption by electron irradiation. Repeated electron beam line scanning is thought to be more effective in wire fabrication than single slow scanning. Conditions arise, however, where the result is other than anticipated. Results are explained by the secondary electrons emitted by the primary electron beam considering the angle dependence of the secondary electron yield. [References: 4]
机译:导电线是通过电子束感应沉积法制成的。在制造过程中,已使用速率方程式证明了束诱导过程的沉积特性,该方程式描述了通过电子辐照进行的前体分子的供应和消耗。认为重复的电子束线扫描在导线制造中比单次慢扫描更有效。但是,如果结果不是预期的,则会出现条件。考虑到二次电子产率的角度依赖性,结果由一次电子束发射的二次电子来解释。 [参考:4]

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