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Nanofocusing probe optimization with anti-reflection coatings for a high-density optical memory

机译：具有防反射涂层的纳米聚焦探头优化，用于高密度光学存储器

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We discuss the optimization aspects of nanofocusing recording probes. In this paper we also research all of the technological aberrations affecting the nanofocused spots. The probe numerical aperture (NA) has been elevated about threefold from 0.72 to 2.15 optimizing the diffraction functions under the full width at half maximum (FWHM) size of 130 nm. The microlens (ML) physical light efficiency is about nine times higher than the values published in previous works. The nanofocused spot is calculated as 25 nm for a micro-laser beam of 8 mum and the diffraction limit is 150 um using NA = 2.153 for an entire ML diameter over 13 mum. We have obtained nanofocused spots from 20 nm at the geometrical limit and up to 130 nm at the diffraction FWHM size using anti-reflection coatings on both surfaces of the fabricated GaP ML array. The optical power throughput of the nanofocusing probe has been raised 4.0-4.75-fold applying antireflection optimization.
机译：我们讨论了纳米聚焦记录探针的优化方面。在本文中，我们还研究了影响纳米聚焦点的所有技术像差。探针的数值孔径（NA）已从0.72提高到2.15约三倍，从而优化了130 nm半峰全宽（FWHM）尺寸下的衍射功能。微透镜（ML）的物理光效率约为以前工作中发表的值的九倍。对于8微米的微激光束，纳米聚焦点计算为25 nm，对于13微米以上的整个ML直径，使用NA = 2.153时，衍射极限为150微米。我们在制造的GaP ML阵列的两个表面上都使用抗反射涂层，获得了从几何极限的20 nm到衍射FWHM尺寸的高达130 nm的纳米聚焦点。纳米聚焦探头的光功率通过应用抗反射优化已提高了4.0-4.75倍。

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