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首页> 外文期刊>Nanotechnology >In situ probing of the growth and morphology in electron-beam-induced deposited nanostructures
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In situ probing of the growth and morphology in electron-beam-induced deposited nanostructures

机译：电子束诱导沉积纳米结构的生长和形貌的原位探测

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摘要

Three series of nanofiber structures were grown via electron-beam-induced deposition as a function of beam energy (1, 5 and 20 keV) using a W( CO) 6 precursor. At each beam energy a time series ranging from 0.5 to 128 s was performed and the sample current during each growth was monitored versus growth time. The subsequent current traces have been correlated to the nanostructure morphology. For the 1 and 5 keV beam energy, two distinct lateral growth regimes were observed. Initially there is a rapid base broadening consistent with the electron beam interaction region. Secondly, a lateral 'platelet' type growth was observed. At 20 keV beam energy, there is an initial rapid broadening: however, no 'platelet' growth is observed. For each beam energy, the measured current trace is correlated to the observed growth regimes.
机译：使用W（CO）6前驱体，通过电子束诱导的沉积，将三系列纳米纤维结构作为电子束能量（1、5和20 keV）的函数进行生长。在每个束能量下，执行从0.5到128 s的时间序列，并监测每个生长期间的样品电流与生长时间的关系。随后的电流迹线已经与纳米结构形态相关。对于1和5 keV束能量，观察到两个不同的横向生长机制。最初，有一个快速的基极展宽，与电子束相互作用区域一致。其次，观察到横向“血小板”型生长。在束能量为20 keV时，最初会迅速变宽：但是，未观察到“血小板”的生长。对于每个束能量，测得的电流迹线与观察到的生长机制相关。

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