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Mechanical and magnetic properties of Ni-doped metallic TaSi_2 nanowires

机译:Ni掺杂金属TaSi_2纳米线的机械和磁性

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摘要

Ni-doped TaSi_2 nanowires were synthesized by annealing NiSi_2 film as the mediated layer in a Ta reductive ambient at 950 deg C for 16 h. The hysteresis loop has a hard magnetization axis and high remanence with a coercive force of 120 Oe when the applied magnetic field is perpendicular to the substrate (parallel to the nanowires) and the hysteresis loop has an easy magnetization axis and low remanence with a coercive force of about 95 Oe when the applicd magnetic field is parallel to the substrate (perpendicular to the nanowires). The elastic modulus of the nanowires was measured to be 170 485 GPa.
机译:通过在950℃的Ta还原环境中退火NiSi_2膜作为介导层,合成Ni掺杂的TaSi_2纳米线16 h。当施加的磁场垂直于基板(平行于纳米线)时,磁滞回线具有硬磁化轴和较高的剩磁,矫顽力为120 Oe,磁滞回线具有易磁化轴和较低的剩磁并具有矫顽力当所施加的磁场平行于基板(垂直于纳米线)时,磁场强度约为95 Oe。测得的纳米线的弹性模量为170 485 GPa。

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