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Nano-strip grating lines self-organized by a high speed scanning CW laser

机译:高速扫描连续激光自组织的纳米带光栅线

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After a laser annealing experiment on Si wafer, we found an asymmetric sheet resistance on the surface of the wafer. Periodic nano-strip grating lines (nano-SGLs) were self-organized along the trace of one-time scanning of the continuous wave (CW) laser. Depending on laser power, the nano-trench formed with a period ranging from 500 to 800nm with a flat trough between trench structures. This simple method of combining the scanning laser with high scanning speed of 300mmin~(-1) promises a large area of nanostructure fabrication with a high output. As a demonstration of the versatile method, concentric circles were drawn on silicon substrate rotated by a personal computer (PC) cooling fan. Even with such a simple system, the nano-SGL showed iridescence from the concentric circles.
机译:在硅晶片上进行激光退火实验后,我们在晶片表面发现了不对称的薄层电阻。沿着连续波(CW)激光的一次扫描轨迹,周期性地组织了纳米带状光栅线(nano-SGL)。根据激光功率,形成的纳米沟槽的周期在500至800nm之间,沟槽结构之间具有平坦的沟槽。这种将扫描激光器与300mmin〜(-1)的高扫描速度相结合的简单方法,有望在大面积的纳米结构制造中实现高输出。为了演示这种通用方法,在由个人计算机(PC)冷却风扇旋转的硅基板上绘制了同心圆。即使使用这种简单的系统,纳米SGL仍会显示出同心圆的虹彩。

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